According to international sources, China has taken a significant step in producing advanced chips needed for artificial intelligence and modern electronic devices. A prototype machine based on extreme ultraviolet (EUV) lithography technology was developed in a secret laboratory in Shenzhen. This technology has so far been mainly controlled by Western countries.
The sources say the prototype is still in the testing phase and has not yet produced fully functional chips. Nevertheless, the machine can generate the required ultraviolet light. The Chinese government aims to produce the first chips using this technology by 2028, although experts say the realistic timeline may be 2030.
The project is part of a multi-year strategic program by the Chinese government. State scientific centers and major technology companies are involved. The main goal is to produce advanced chips entirely with local capabilities, without dependence on foreign countries.
Experts view this initiative as a key turning point in China’s drive for technological independence. The process could significantly impact the global semiconductor market and technological competition.
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